Pulsed Laser Annealing Technology for Nano-Scale Fabrication of Silicon-Based Devices in Semiconductors

Book chapter

J. Lawrence, K. L. Pey and P. S. Lee

Advances in Laser Materials Processing, pp.299-337

Woodhead Publishing Series in Welding and Other Joining Technologies, Woodhead Publ Ltd

01/01/2018

Abstract

Engineering

Engineering, Mechanical

Materials Science

Materials Science, Multidisciplinary

Metallurgy & Metallurgical Engineering

Optics

Physical Sciences

Science & Technology

Technology

1 Record Views

Title: Pulsed Laser Annealing Technology for Nano-Scale Fabrication of Silicon-Based Devices in Semiconductors
Creators - without role: J. Lawrence - University of Chester
K. L. Pey - Nanyang Technological University
P. S. Lee - Nanyang Technological University
Contributors - without role: J Lawrence
Publication Details: Advances in Laser Materials Processing, pp.299-337
Series: Woodhead Publishing Series in Welding and Other Joining Technologies
Publisher: Woodhead Publ Ltd; CAMBRIDGE
Number of pages: 39
Identifiers: 9914319109846
Academic Unit: Engineering Product Development (EPD); Temasek Lab
Language: English
Resource Type: Book chapter