Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions

Conference proceeding

Y. F Chong, K. L Pey, A. T. S Wee, A See, C.-H Tung, R Gopalakrishnan and Y. F LU

Advanced microelectronic processing techniques : 28-30 November 2000, Singapore, Vol.4227, pp.124-132

Advanced microelectronic processing techniques (Singapore, 28-30 November 2000)

2000

Abstract

Applied sciences

Electronics

Exact sciences and technology

Interfaces

Microelectronic fabrication (materials and surfaces technology)

Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices

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Title: Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
Creators - without role: Y. F Chong - National University of Singapore
K. L Pey - Duke-NUS Medical School
A. T. S Wee - National University of Singapore
A See - Chartered Semiconductor Manufacturing Ltd., 60, Woodlands Industrial Park D Street 2, Singapore 738406, Singapore
C.-H Tung - Singapore Science Park
R Gopalakrishnan - Singapore Science Park
Y. F LU - National University of Singapore
Publication Details: Advanced microelectronic processing techniques : 28-30 November 2000, Singapore, Vol.4227, pp.124-132
Conference: Advanced microelectronic processing techniques (Singapore, 28-30 November 2000)
Publisher: SPIE
Number of pages: 9
Identifiers: 9914229709846
Academic Unit: Engineering Product Development (EPD); Temasek Lab
Language: English
Resource Type: Conference proceeding