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- Title
- Impact of nitrogen ion-implantation on deep submicron SALICIDE process
- Creators - without role
- Chong W Lim - National University of SingaporeSyamal Lahiri - National University of SingaporeC. H Tung - Institute of Microelectronics (Singapore)Sang M Wong - Chartered Semiconductor Manufacturing Ltd. (Singapore)Kong H Lee - Chartered Semiconductor Manufacturing Ltd. (Singapore)Harianto Wong - Chartered Semiconductor Manufacturing Ltd. (Singapore)Kin L Pey - Chartered Semiconductor Manufacturing Ltd. (Singapore)Lap H Chan - Chartered Semiconductor Manufacturing Ltd. (Singapore)
- Publication Details
- Proceedings of SPIE, Vol.3212(1), pp.151-161
- Conference
- Microelectronic Device Technology
- Number of pages
- 11
- Identifiers
- 9914226709846
- Academic Unit
- Engineering Product Development (EPD); Temasek Lab
- Language
- English
- Resource Type
- Conference proceeding