Laser-induced titanium disilicide formation for submicron technologies

Conference proceeding

Peer reviewed

Y Fchong, K. L Pey, A. T. S Wee, A See, Z. X Shen, C.-H Tung, R Gopalakrishnan and Y. F LU

Journal of electronic materials, Vol.30(12), pp.1549-1553

01/12/2001

Abstract

Applied sciences

Cross-disciplinary physics: materials science; rheology

Electronics

Exact sciences and technology

Materials science

Metallization, contacts, interconnects; device isolation

Microelectronic fabrication (materials and surfaces technology)

Nanoscale materials and structures: fabrication and characterization

Physics

Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices

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Title: Laser-induced titanium disilicide formation for submicron technologies
Creators - without role: Y Fchong - Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore
K. L Pey - Duke-NUS Medical School
A. T. S Wee - National University of Singapore
A See - Woodlands Health Campus
Z. X Shen - Duke-NUS Medical School
C.-H Tung - Singapore Science Park
R Gopalakrishnan - Singapore Science Park
Y. F LU - National University of Singapore
Publication Details: Journal of electronic materials, Vol.30(12), pp.1549-1553
Publisher: Institute of Electrical and Electronics Engineers
Number of pages: 5
Identifiers: 9914222709846
Academic Unit: Engineering Product Development (EPD); Temasek Lab
Language: English
Resource Type: Conference proceeding