Surface preparations impact on 248nm deep UV photo resists adhesion during a wet etch

Conference proceeding

Peer reviewed

Mathieu Foucaud, Philippe Garnier, Vincent Joseph, Erwine Pargon, Nevine Rochat and Raluca Tiron

Solid state phenomena, Vol.195, pp.58-61

Solid State Phenomena

01/01/2013

Abstract

Engineering

Engineering, Electrical & Electronic

Physical Sciences

Physics

Physics, Condensed Matter

Science & Technology

Technology

1 Record Views

Title: Surface preparations impact on 248nm deep UV photo resists adhesion during a wet etch
Creators - without role: Mathieu Foucaud - STMicroelectronics (Czechia)
Philippe Garnier - STMicroelectronics (Czechia)
Vincent Joseph - STMicroelectronics (Czechia)
Erwine Pargon - CNRS LTM, F-38054 Grenoble 9, France
Nevine Rochat - Laboratoire d'Électronique des Technologies de l'Information
Raluca Tiron - Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Contributors - without role: P Mertens
M Meuris
M Heyns
Publication Details: Solid state phenomena, Vol.195, pp.58-61
Series: Solid State Phenomena
Publisher: Trans Tech Publications Ltd
Number of pages: 2
Identifiers: 9912704409846
Academic Unit: EPD Pillar
Language: English
Resource Type: Conference proceeding