Abstract
We have explored the optical near-field technology for the fabrication of subwavelength-size binary bit by the combination of the femtosecond laser of the second harmonic output with the near-field scanning optical microscopy (NSOM). The photosensitive polymer material was exposed, and the nanopatterns with feature size smaller than the laser wavelenght can be generated. It was found that the feature size depends strongly on the gap between the fiber probe tip and substrate surface. The approach offers the advantages of high precision, speed and selectivity in nanopatterning, and is promising to be used in data storage device manufacture for high density data storage.