Atomic layer deposition of a MoS2 film

Journal article

Peer reviewed

Lee Kheng Tan, Bo Liu, Jing Hua Teng, Shifeng Guo, Hong Yee Low, Hui Ru Tan, Christy Yuen Tung Chong, Ren Bin Yang and Kian Ping Loh

Nanoscale, Vol.6(22), pp.14002-14002

01/11/2014

PMID: 26036225

Abstract

Chemistry

Chemistry, Multidisciplinary

Materials Science

Materials Science, Multidisciplinary

Nanoscience & Nanotechnology

Physical Sciences

Physics

Physics, Applied

Science & Technology

Science & Technology - Other Topics

Technology

url

https://doi.org/10.1039/c4nr90076fView

Published (Version of record) Open

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Title: Atomic layer deposition of a MoS2 film
Creators - without role: Lee Kheng Tan - Agency for Science, Technology and Research
Bo Liu - Natl Univ Singapore, Dept Phys, Singapore 117551, Singapore
Jing Hua Teng - A STAR Inst Mat Res & Engn, Singapore 117602, Singapore
Shifeng Guo - Agency for Science, Technology and Research
Hong Yee Low - Singapore University of Technology and Design
Hui Ru Tan - A STAR Inst Mat Res & Engn, Singapore 117602, Singapore
Christy Yuen Tung Chong - A STAR Inst Mat Res & Engn, Singapore 117602, Singapore
Ren Bin Yang - A STAR Inst Mat Res & Engn, Singapore 117602, Singapore
Kian Ping Loh - National University of Singapore
Publication Details: Nanoscale, Vol.6(22), pp.14002-14002
Publisher: Royal Soc Chemistry
Number of pages: 1
Identifiers: 9911037009846
Academic Unit: EPD Pillar
Language: English
Resource Type: Journal article