CO2 laser annealing of sputtering deposited NiTi shape memory thin films

Journal article

Peer reviewed

Q HE, M. H Hong, W. M Huang, T. C Chong, Y. Q FU and H. J DU

Journal of micromechanics and microengineering, Vol.14(7), pp.950-956

01/07/2004

Abstract

Applied sciences

Electronics

Exact sciences and technology

General

Instruments, apparatus, components and techniques common to several branches of physics and astronomy

Mechanical engineering. Machine design

Mechanical instruments, equipment and techniques

Microelectronic fabrication (materials and surfaces technology)

Micromechanical devices and systems

Physics

Precision engineering, watch making

Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices

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Title: CO2 laser annealing of sputtering deposited NiTi shape memory thin films
Creators - without role: Q HE - Data Storage Institute
M. H Hong - Data Storage Institute
W. M Huang - Nanyang Technological University
T. C Chong - Data Storage Institute
Y. Q FU - Nanyang Technological University
H. J DU - Nanyang Technological University
Publication Details: Journal of micromechanics and microengineering, Vol.14(7), pp.950-956
Publisher: Institute of Physics
Number of pages: 7
Identifiers: 9911277509846
Academic Unit: Temasek Lab
Language: English
Resource Type: Journal article