Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope

Journal article

Peer reviewed

Q HE, W. M Huang, M. H Hong, M. J WU, Y. Q FU, T. C Chong, F Chellet and H. J DU

Smart materials and structures, Vol.13(5), pp.977-982

01/10/2004

Abstract

Exact sciences and technology

Fundamental areas of phenomenology (including applications)

General

General equipment and techniques

Instruments, apparatus, components and techniques common to several branches of physics and astronomy

Measurement and testing methods

Physics

Servo and control equipment; robots

Solid mechanics

Structural and continuum mechanics

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Title: Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope
Creators - without role: Q HE - Data Storage Institute
W. M Huang - Nanyang Technological University
M. H Hong - Data Storage Institute
M. J WU - Nanyang Technological University
Y. Q FU - Nanyang Technological University
T. C Chong - Data Storage Institute
F Chellet - Nanyang Technological University
H. J DU - Nanyang Technological University
Publication Details: Smart materials and structures, Vol.13(5), pp.977-982
Publisher: Institute of Physics
Number of pages: 6
Identifiers: 9911393409846
Academic Unit: Temasek Lab
Language: English
Resource Type: Journal article