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Combinatorial-mold imprint lithography: A versatile techniquefor fabrication of three-dimensional polymer structures
Journal article   Open access   Peer reviewed

Combinatorial-mold imprint lithography: A versatile techniquefor fabrication of three-dimensional polymer structures

Hong Low, Wei Zhao and Jarrett Dumond
Applied physics letters, Vol.89(2), pp.023109-023109-3
12/07/2006

Abstract

A two-step fabrication technique based on nanoimprint lithography is described for the fabrication of three-dimensional micro- and nanostructures. By combining simple two-dimensional geometries from two molds, complex and useful three-dimensional structures are obtained. The careful selection of mold geometries constitutes a simplified and efficient approach toward building up desirable three-dimensional structures without resorting to the use of a sacrificial process or components. Three-dimensional structures fabricated for a variety of specific applications are presented using both thermoplastic and cross-linked polymer materials.
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https://doi.org/10.1063/1.2219148View
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