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Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations
Journal article   Peer reviewed

Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations

Rafal A. Mickiewicz, Joel K. W. Yang, Adam F. Hannon, Yeon-Sik Jung, Alfredo Alexander-Katz, Karl K. Berggren and Caroline A. Ross
Macromolecules, Vol.43(19), pp.8290-8295
12/10/2010

Abstract

Physical Sciences Polymer Science Science & Technology
Self-consistent field theory methodology is used to explore the graphoepitaxy of sphericalmorphology block copolymers templated by an array of posts, as well as to predict the formation lapel-iodic templated structures, giving an excellent agreement with experimental results. Simulations in two and three dimensions were performed on model hexagonal lattices of posts with spacing, L-post that was varied in the range L-post = 1.7 L-0 to 3.9 L-0, where L-0 is the equilibrium period of the block copolymer. The effects of changing the diameter of the posts and the volume fraction of the block copolymer were investigated, and the formation of a structure with designed aperiodicities was successfully modeled.

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