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Fabrication of three-dimensional hemispherical structures using photolithography
Journal article   Peer reviewed

Fabrication of three-dimensional hemispherical structures using photolithography

Chee Tiong Lim, Hong Yee Low, Johnson K. K. Ng, Wen-Tso Liu and Yong Zhang
Microfluidics and nanofluidics, Vol.7(5), pp.721-726
01/11/2009

Abstract

Instruments & Instrumentation Nanoscience & Nanotechnology Physical Sciences Physics Physics, Fluids & Plasmas Science & Technology Science & Technology - Other Topics Technology
A photolithography technique using SU-8 and PDMS was developed to fabricate three-dimensional hemispherical structures. This technique utilized a mask-aligner and normal binary coded photomasks to generate hemispherical pits on SU-8, followed by PDMS molding to obtain an array of dome-shaped structures. Using this technique, a microfluidic device was fabricated with a patterning area that consisted of an array of 5 mu m wells and dome-shaped structures with 10 mu m diameter and 6 mu m height. Encoded microbeads, 6 mu m in size, were immobilized and patterned in the microfluidic device under flow conditions and a DNA hybridization experiment was performed to demonstrate the incorporation of encoded beads that would enable a high level of multiplexing in bioassays.

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