Kinetic Monte Carlo simulation of Ta deposition on Ta (100) surface

Journal article

Peer reviewed

Gwang-Soo Kim, D Klug, J Tse and PING WU

Journal of materials science, Vol.39(4), pp.1519-1522

15/02/2004

Abstract

Applied sciences

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Metals. Metallurgy

Methods of deposition of films and coatings; film growth and epitaxy

Physics

Theory and models of film growth

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Title: Kinetic Monte Carlo simulation of Ta deposition on Ta (100) surface
Creators - without role: Gwang-Soo Kim - National Research Council Canada
D Klug - Steacie Institute for Molecular Sciences
J Tse - National Research Council Canada
PING WU - Institute of High Performance Computing
Publication Details: Journal of materials science, Vol.39(4), pp.1519-1522
Publisher: Springer
Number of pages: 4
Identifiers: 9912693809846
Academic Unit: EPD Pillar
Language: English
Resource Type: Journal article