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Magnetic and electrical transport properties of delta-doped amorphous Ge:Mn magnetic semiconductors
Journal article   Peer reviewed

Magnetic and electrical transport properties of delta-doped amorphous Ge:Mn magnetic semiconductors

H.L. Li, H.T. Lin, Y.H. Wu, T. Liu, Z.L. Zhao, G.C. Han and T.C. Chong
Journal of magnetism and magnetic materials, Vol.303(2), pp.e318-e321
01/08/2006

Abstract

Amorphous diluted magnetic semiconductors (DMSs) Antiferromagentic coupling Delta-doping Ferromagnetic ordering
We report on the growth and characterization of delta-doped amorphous Ge:Mn diluted magnetic semiconductor thin films on GaAs (0 0 1) substrates. The fabricated samples exhibit different magnetic behaviors, depending on the Mn doping concentration. The Curie temperature was found to be dependent on both the Mn doping concentration and spacing between the doping layers. A sharp drop in magnetization and rise in resistivity are observed at low temperature in samples with high Mn doping concentrations, which is also accompanied by a negative thermal remanent magnetization (TRM) in the higher temperature range. The temperature at which the magnetization starts to drop and the negative TRM appears show a correlation with the Mn doping concentration. The experimental results are discussed based on the formation of ferromagnetic regions at high temperature and antiferromagnetic coupling between these regions at low temperature.

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