Pattern Generation by Using Multistep Room-Temperature Nanoimprint Lithography

Journal article

Peer reviewed

Stefan Harrer, Joel K. W Yang, Giovanni A Salvatore, Karl K Berggren, Filip Ilievski, Caroline A Ross and Kwang Wei Joel Yang

IEEE transactions on nanotechnology, Vol.6(6), pp.639-644

01/11/2007

Abstract

Applied sciences

Electronics

Exact sciences and technology

Fundamental areas of phenomenology (including applications)

Gratings

Microelectronic fabrication (materials and surfaces technology)

Optical elements, devices, and systems

Optics

Physics

Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices

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Title: Pattern Generation by Using Multistep Room-Temperature Nanoimprint Lithography
Creators - without role: Stefan Harrer - Technical University of Munich
Joel K. W Yang - Massachusetts Institute of Technology
Giovanni A Salvatore - Massachusetts Institute of Technology
Karl K Berggren - Massachusetts Institute of Technology
Filip Ilievski - Massachusetts Institute of Technology
Caroline A Ross - Massachusetts Institute of Technology
Kwang Wei Joel Yang - EPD Pillar
Publication Details: IEEE transactions on nanotechnology, Vol.6(6), pp.639-644
Publisher: Institute of Electrical and Electronics Engineers
Number of pages: 6
Identifiers: 9911743609846
Academic Unit: Engineering Product Development (EPD)
Language: English
Resource Type: Journal article