Phase and layer stability of Ni- and Ni(Pt)-silicides on narrow poly-Si lines

Journal article

Peer reviewed

P. S Lee, K. L Pey, D Mangelinck, J Ding, D. Z Chi, J. Y Dai and L Chan

Journal of the Electrochemical Society, Vol.149(6), pp.G331-G335

2002

Abstract

Condensed matter: structure, mechanical and thermal properties

Exact sciences and technology

Interface structure and roughness

Physics

Solid surfaces and solid-solid interfaces

Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)

url

https://doi.org/10.1149/1.1473192View

Published (Version of record) Open

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Title: Phase and layer stability of Ni- and Ni(Pt)-silicides on narrow poly-Si lines
Creators - without role: P. S Lee - Department of Materials Science, National University of Singapore, Singapore 119260, Singapore
K. L Pey - Duke-NUS Medical School
D Mangelinck - Centre National de la Recherche Scientifique
J Ding - National University of Singapore
D. Z Chi - Duke-NUS Medical School
J. Y Dai - Chartered Semiconductor Manufacturing Limited, Singapore 738406, Singapore
L Chan - Chartered Semiconductor Manufacturing Limited, Singapore 738406, Singapore
Publication Details: Journal of the Electrochemical Society, Vol.149(6), pp.G331-G335
Publisher: Electrochemical Society
Identifiers: 9914327909846
Academic Unit: Engineering Product Development (EPD); Temasek Lab
Language: English
Resource Type: Journal article