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Properties and reactive sputtering parameters of GeN film for high-density phase-change optical disk
Journal article   Peer reviewed

Properties and reactive sputtering parameters of GeN film for high-density phase-change optical disk

X S Miao, T C Chong, L P Shi, P K Tan, J M Li and K G Lim
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, Vol.40(3B), pp.1581-1584
2001

Abstract

Physical Sciences Physics Physics, Applied Science & Technology
The dependence of optical and thermal properties of phase-change optical disks on the diffusion of sulfur atoms from ZnS-SiO2 dielectric layers into a GeSbTe phase-change recording layer was simulated, The influence of reactive sputtering parameters on the properties of GeN films has also been studied. Significant improvement in the direct overwriting cycles was achieved in the 4.7 GB digital versatile disk-random access memory (DVD-RAM) disk with a GeN inter-face layer after optimizing the sputtering parameters of the GeN film.

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