Abstract
A complementary metal oxide semiconductor-compatible transmission filter composed of subwavelength nanostructures is demonstrated through design, numerical modeling, and experimental verification. The tuning of the filters' peak wavelength via lithographic means in a single dielectric layer, obviating the need for altering the device layer thickness to achieve different filter wavelengths is demonstrated. The Fabry-Perot function is achieved by sandwiching the nanostructures between a bottom distributed Bragg reflector and a top reflector composed of a layer of silver. A spectral resolution of 10 nm-30 nm full width at half maximum and peak transmission efficiency of approximate to 70% in the multispectral optical filters in both numerical simulations and experimental characterization is experimentally demonstrated. This approach provides a new paradigm in which to achieve color filters, eliminating the need for multiple mask steps for varied device layer thicknesses conventionally used to achieve Fabry-Perot filters, greatly reducing the manufacturing process cost and complexity.