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Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection
Journal article   Peer reviewed

Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection

Xinyu Zhu, Shurong Dong, Fangjun Yu, Feifan Deng, Kalya Shubhakar, Kin Leong Pey, Jikui Luo and Shubhakar Kalya
Nanomaterials (Basel, Switzerland), Vol.12(10), p.1743
19/05/2022
PMID: 35630965

Abstract

diode silicon-controlled rectifier ESD FinFET
A new silicon-controlled rectifier embedded diode (SCR-D) for 7 nm bulk FinFET process electrostatic discharge (ESD) protection applications is proposed. The transmission line pulse (TLP) results show that the proposed device has a low turn-on voltage of 1.77 V. Compared with conventional SCR and diode string, the proposed SCR-D has an additional conduction path constituting by two additional inherent diodes, which results in a 1.8-to-2.2-times current surge capability as compared with the simple diode string and conventional SCR with the same size. The results show that the proposed device meets the 7 nm FinFET process ESD design window and has already been applied in actual circuits.
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https://doi.org/10.3390/nano12101743View
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