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Stability of functional polymers after plasticizer-assisted imprint lithography
Journal article

Stability of functional polymers after plasticizer-assisted imprint lithography

R. M. Reano, Y. P. Kong, H. Y. Low, L. Tan, F. Wang, S. W. Pang and A. F. Yee
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol.22(6), pp.3294-3299
The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
11/2004

Abstract

polymers
Poly(3,4-ethylenedioxythiophene) (PEDOT) and chitosan structures on Si, patterned by plasticizer-assisted imprint lithography (PAIL), are examined under a variety of imprinting conditions. The stabilities of pattern dimension and chemical functionality of these polymers are presented. Thermal annealing for 5 min at 80 ° C is found to be an effective method to stabilize imprinted PEDOT patterns. Biofunctionality in chitosan as a function of imprint temperature and pressure is examined through fluorescence spectroscopy. The accessibility of the amine group of chitosan is observed to decrease for imprint temperatures above 80 ° C , whereas the chemical functionality is not affected by pressure up to 1 MPa . Fluorescence spectra of the chitosan are observed to be strong functions of exposure time to O 2 plasma.
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https://doi.org/10.1116/1.1825013View
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