Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser

Journal article

Peer reviewed

Y Lin, M. H Hong, W. J Wang, Y. Z Law and T. C Chong

Applied physics. A, Materials science & processing, Vol.80(3), pp.461-465

01/02/2005

Abstract

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Physics

Surface treatments

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Title: Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser
Creators - without role: Y Lin - National University of Singapore
M. H Hong - Data Storage Institute
W. J Wang - Data Storage Institute
Y. Z Law - Department of Electrical and Computer Engineering, National University of Singapore, 1 Engineering Drive 3, Singapore 117576, Singapore
T. C Chong - Data Storage Institute
Publication Details: Applied physics. A, Materials science & processing, Vol.80(3), pp.461-465
Publisher: Springer
Number of pages: 5
Identifiers: 9911288309846
Academic Unit: Temasek Lab
Language: English
Resource Type: Journal article